Probing formation and epitaxy of ultrathin Titanium Silicide using low and medium energy ion scattering
Published:Dec 18, 2025 12:49
•1 min read
•ArXiv
Analysis
This article reports on research using ion scattering techniques to study the formation and epitaxial growth of ultrathin titanium silicide. The focus is on the materials science aspect, investigating the structural properties at the atomic level. The use of low and medium energy ion scattering suggests a detailed analysis of the material's surface and interface properties.
Key Takeaways
- •Focuses on the formation and epitaxial growth of ultrathin titanium silicide.
- •Employs low and medium energy ion scattering techniques.
- •Investigates structural properties at the atomic level.
- •Implies detailed analysis of surface and interface properties.
Reference
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